Silk screen process introduction-section two

- Jul 02, 2019-

As a 20 years manufacturer of kinds of enclosure for electronic device,the silk screen is a very important process in custom metal/plastic enclosure.

3.Main application

a.Books: printed covers, inserts, calendars, trademarks, blind documents, etc.

b.Ceramic: direct printing and transfer of flat and curved surfaces

c.Printing and dyeing: printing large-format cloth, such as curtains, flags, towels, bags, vests, etc.

e.Fine arts: printing various decorations and advertising materials, such as glass, plastic, wallpaper, decorative panels, metal containers, etc.

f.Electronics: printed resistors, capacitors, boards, thick film integrated circuits

Can also print electronic components, thermal components, optical frequency response components, functional diagrams, etc.

4. Plate making method

1). manual plate making

A, cut and cut hair - cut the original paper and post it on the screen:

B. Describe the hair-filling and painting non-leakage parts:

2). photoengraving

A. Direct method—coat the photosensitive paste directly on the tensioned wire mesh, and then attach the positive film to it for printing.Rinse, develop, and dry.

B. Indirect method—The original plate is attached to the photosensitive film for printing, and the imaging film is transferred to the tensioning screen.

C. Mixing method—The photosensitive paste is applied to the screen printing surface, and then the photosensitive film is pasted on the screen and scraped and compacted, and plated, developed, and dried.

3). Electronic plate making

Make a special film on the screen, use light to paint the original, convert the light energy into electrical energy and use it to punch holes in the screen. In addition, there are photographic etching methods, electroplating methods, infrared plate making methods, and the like.

Regardless of the method of making the plate, the ultimate goal is to make the screen portion of the graphic portion emptied instead of the screen portion of the image portion. In photolithography, the principle of direct method and indirect method is the same, that is, the photosensitive film exposed to light after hardening is hardened by luminescent chemical reaction to remain on the screen and block the mesh, and this part of the screen does not allow ink to pass through during printing. The substrate is formed into a blank, and the unilluminated photosensitive film is washed away after being developed, and the mesh is thereby exposed. When the printing is performed, the leaked portion allows the ink to pass through to become a graphic of the substrate.